New INFICON UL3000 Fab Defines Test Standards in Semiconductor Manufacturing

The UL3000 Fab from INFICON is a new helium leak detector for leak testing applications in semiconductor manufacturing. With the INFICON UL3000 Fab, semiconductor process chambers can be quickly and reliably tested for leaks. The instrument uses helium as a tracer gas and detects even the smallest leak rates up to 5 x 10^-12 atm cc/s, thus providing the highest seal confirmation tightness of vacuum chambers for wafer production.

UL3000 Fab is designed for optimal stability and easy maneuverability. Thanks to its slim mobile design and rugged construction, access to test areas is not a problem. Once the leak is located, UL3000 Fab makes the user's work simple with a user-friendly rotating touch screen that offers a modern menu structure and an intuitive user interface. The menu can also be accessed via a mobile device - which makes the instrument easy to control remotely, particularly if the space conditions are cramped and the instrument is operated at some distance from the wafer manufacturing chamber. Another feature is the I·Zero 2.0 function which makes it possible to suppress helium background in the test object without affecting the accuracy and reliability of the test, so the leak test can begin faster.

While the UL3000 Fab is designed to ensure the tightness of wafer chambers by means of a helium vacuum test, the optional UL3000 Fab PLUS model also offers the user sniffer leak detection capability for pipes with various process gases.

UL3000 Fab PLUS also features HYDRO·S software which is capable of suppressing moisture and hydrogen effects on the helium leak rate. The result is the leak test can be started earlier.

Slim design, intuitive user guidance and fast results are just a few advantages of the new UL3000 Fab. Read more about the UL3000 Fab here.

For more information about the UL3000 Fab Helium Leak Detector contact your nearest INFICON office.